Xiaohang Li

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Inductively Coupled Plasma Reactive Ion Etching of (−201) β‐Ga2O3 Nano‐Fins

Nov 15, 2024 | onlinelibrary.wiley.com | Vishal Khandelwal |Yi Lu |Saravanan Yuvaraja |Xiaohang Li

Conflict of Interest The authors declare no conflict of interest. Supporting Information Filename Description pssb202400290-sup-0001-SuppData-S1.pdf321.6 KB Supplementary Material References 1 , , , , , , Appl. Phys. Express 2012, 5, 035502. 2 , , , , , , , , , , , , , Nat. Commun. 2022, 13, 3900. 3 , , , , , IEEE Electron Device Lett. 2016, 37, 212. 4 , , , , , , , , , , , , , , Appl. Phys. Lett. 2022, 121, 072102. 5 , , , , , , , in DRC 2017 - Device Res.

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