Dandan Han

May 27, 2024 | onlinelibrary.wiley.com | Xin Zhou |Dandan Han |Qi Zhang |Xiaodong Li

Conflict of Interest The authors declare no conflict of interest. Supporting Information Filename Description smll202400970-sup-0001-SuppMat.docx22.4 MB Supporting Information References 1a) , , , , , , , , , , , , , , , , , , , , , Nat. Mater. 2023, 22, 18; b) , , , , , , , , , , Nat. Mater. 2012, 11, 717. 2a) , , , , Chem. Rev. 2012, 112, 1805; b) , , J. Appl. Phys. 1963, 34, 2409. 3a) , , , , , , , Chem. Mater.

Nov 11, 2023 | dx.doi.org | Yuxin Zhang |Beibei Li |Jian Liu |Dandan Han

Download Hi-Res ImageDownload to MS-PowerPointCite This:Crystal Growth & Design 2024, XXXX, XXX This article has not yet been cited by other publications.

Mar 30, 2023 | nature.com | Dandan Han

AbstractPlasmonic lithography, which uses the evanescent electromagnetic (EM) fields to generate image beyond the diffraction limit, has been successfully demonstrated as an alternative lithographic technology for creating sub-10 nm patterns. However, the obtained photoresist pattern contour in general exhibits a very poor fidelity due to the near-field optical proximity effect (OPE), which is far below the minimum requirement for nanofabrication.