Lifei Liu

Aug 11, 2024 | onlinelibrary.wiley.com | Lifei Liu |Xiaoqing Yang |Pengfei Li |Luyuan Zhang

Supporting Information Filename Description aoc7670-sup-0001-Supplementary_Material.docxWord 2007 document , 6.6 MB Figure S1 The energy-dispersive X-ray spectroscopy images of scCu-MOF-74 (scale bar: 2.5 μm). Figure S2. SEM images of Cu-MOF-74. Scale bars: 5 μm in (a) and 2 μm in (b). Figure S3. Wide-range XPS spectra of scCu-MOF-74 and Cu-MOF-74. Figure S4. C 1s XPS spectra of scCu-MOF-74 and Cu-MOF-74. Figure S5. In situ FTIR spectra of Cu-MOF-74 before and after adsorbed pyridine.

Jun 20, 2023 | onlinelibrary.wiley.com | Rong Wu |Ming Luo |Lifei Liu |Lei Liu

Abstract The fineness of the photolithographic pattern depends largely on the composition and structure of the photoresist, and different structures endow metal-based photoresists with different photon-absorbing capabilities. Here, we synthesized zinc-based photoresists with different electron-effect substituents (amine and bromine) in the ligands and investigated the influence of the ligand groups on the sensitivity and resolution at deep ultraviolet and electron beam.