Ji-Hoon Ahn

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Ultrathin Metal Films with Low Resistivity via Atomic Layer Deposition: Process Pressure Effect on Initial Growth Behavior of Ru Films

Aug 21, 2024 | pubs.acs.org | Na-Gyeong Kang |Min-Ji Ha |Ji-Hoon Ahn
Ultrathin Metal Films with Low Resistivity via Atomic Layer Deposition: Process Pressure Effect on Initial Growth Behavior of Ru Films

Aug 21, 2024 | pubs.acs.org | Ji-Hoon Ahn |Na-Gyeong Kang |Min-Ji Ha
High-quality SiNx thin film growth at 300 ℃ using atomic layer deposition with hollow cathode plasma

Jun 12, 2023 | pubs.rsc.org | Jae Park |Tae Jun Seok |Ji-Hoon Ahn |Woo-Hee Kim

High-quality SiNx thin film growth at 300 ℃ using atomic layer deposition with hollow cathode plasma Jae Chan Park, Dae Hyun Kim, Tae Jun Seok, Dae Woong Kim, Ji-Hoon Ahn, Woo-Hee Kim and Tae Joo Park Abstract We report high-quality atomic-layer-deposited SiNx thin films using a novel remote plasma source, hollow cathode plasma (HCP), at a low temperature of 300 ℃.

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