Miao Yuan

Jan 21, 2025 | opg.optica.org | Miao Yuan |Zhen Li |Weichen Huang |ZhaoXuan Li

Scanning technology is widely used in current lithography. During scanning, any point on the wafer scanning through the field of view (FOV) is successively affected by varying levels of polarization aberrations (PAs) that depend on the position within the FOV. However, current computational lithography studies for extreme ultraviolet lithography (EUVL) neglect this effect of the “dynamic PA” caused by scanning.

Oct 31, 2024 | opg.optica.org | Miao Yuan |Zhen Li |Weichen Huang |ZhaoXuan Li

The advanced technology node has an exact error tolerance. The effectof projection objective aberration on imaging cannot be neglected. Inorder to reduce the effect of aberration, considering the centralobscuration of the high-NA extreme ultraviolet projection objective,we propose a Tatian polynomial-based annular pupil wavefrontoptimization (TBAPWO) method. An active pupil consisting of 64-termTatian polynomials is incorporated into the imaging model.